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Coordinated Apertured and Embossed Topsheet Layer Materials, and Absorbent Articles Containing Such

U.S. Patent No. 9,173,782 B2

Author Image

By: Tara Olivo

Associate Editor at Nonwovens Industry, Rodman Media

Wendy M. Takken, Alpharetta, GA; Hue Scott Snowden, Canton, GA; Adrienne R. Loyd, Neenah, WI; Heidi B. Hopkins, Neenah, WI; Ramona Zenkich, Appleton, WI; and Katie A. Boland, Neenah, WI. Assigned to Kimberly-Clark Worldwide, Inc., Neenah, WI.
Filed: 3/28/13
Issued: 11/3/15

A topsheet layer material with coordinated apertures and embossed channel, said topsheet layer material including a longitudinal direction, a transverse direction and a depth direction, said topsheet layer material including at least one embossed channel wherein said embossed channel includes multiple side edges, and a first series of apertures, wherein said at least one embossed channel has a curvilinear overall shape configuration along either said longitudinal direction, said transverse direction or a combination of longitudinal and transverse directions, and wherein said first series of apertures are positioned in an uninterrupted sequence on said topsheet layer material laterally adjacent said at least one embossed channel along each of said multiple side edges, such that said first series of apertures are configured in the same or similar overall shape configuration as at least one embossed channel overall shape configuration.

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